| 1 |
Nitroxide-Mediated Polymerization of Adamantyl-Functional Methacrylates for 193 nm Photoresists
Maric M, Seok J, Metafiot A, Wylie K
Canadian Journal of Chemical Engineering, 95(4), 708, 2017 |
| 2 |
Challenges in etch: What's new?
Gottscho RA, Nojiri K, LaCara J
Thin Solid Films, 516(11), 3493, 2008 |
| 3 |
193 excimer laser machined electromagnetic optical scanning mirror for a laser projection display
Lin CF, Hou MTK, Wen DC
Materials Science Forum, 505-507, 601, 2006 |
| 4 |
High-reflectance 193 nm Al2O3/MgF2 mirrors
Shang SZ, Shao JD, Liao CY, Yi K, Fan ZX, Chen L
Applied Surface Science, 249(1-4), 157, 2005 |
| 5 |
193 nm 포토레지스트용 산 증식제로 2-나프탈렌술폰산과 2-티오펜술폰산 에스테르에 관한 연구
소진호, 임권택, 최상준, 정연태
Journal of the Korean Industrial and Engineering Chemistry, 15(4), 424, 2004 |
| 6 |
Novel multi-alicyclic polymers for enhancing plasma etch resistance in 193 nm lithography
Lee JH, Ahn KD, Cho I
Polymer, 42(4), 1757, 2001 |
| 7 |
Photofragment translational spectroscopy with state-selective "universal detection": The ultraviolet photodissociation of CS2
McGivern WS, Sorkhabi O, Rizvi AH, Suits AG, North SW
Journal of Chemical Physics, 112(12), 5301, 2000 |
| 8 |
Photodissociation dynamics of propyne at 157 nm
Harich S, Lin JJ, Lee YT, Yang X
Journal of Chemical Physics, 112(15), 6656, 2000 |
| 9 |
Rotational and translational energy distributions of CN(v=0,J) from the hot atom reactions: H+XCN -> HX+CN(v=0,J), where X=Br, Cl, and CN
He G, Tokue I, Macdonald RG
Journal of Chemical Physics, 112(15), 6689, 2000 |
| 10 |
Low-energy electron-energy-loss spectroscopy of condensed acetone: Electronic transitions and resonance-enhanced vibrational excitations
Lepage M, Michaud M, Sanche L
Journal of Chemical Physics, 112(15), 6707, 2000 |
