검색결과 : 10건
| No. | Article |
|---|---|
| 1 |
Chemical resistance of TiO2 and Al2O3 single-layer and multilayer coatings atomic layer deposited from hydrogen-free precursors on silicon and stainless steel Aarik L, Kozlova J, Mandar H, Aarik J, Sammelselg V Materials Chemistry and Physics, 228, 285, 2019 |
| 2 |
Effect of substrate-enhanced and inhibited growth on atomic layer deposition and properties of aluminum-titanium oxide films Arroval T, Aarik L, Rammula R, Kruusla V, Aarik J Thin Solid Films, 600, 119, 2016 |
| 3 |
Atomic layer deposition of rutile and TiO2-II from TiCl4 and O-3 on sapphire: Influence of substrate orientation on thin film structure Moldre K, Aarik L, Mandar H, Niilisk A, Rammula R, Tarre A, Aarik J Journal of Crystal Growth, 428, 86, 2015 |
| 4 |
Growth of TixAl1-xOy films by atomic layer deposition using successive supply of metal precursors Arroval T, Aarik L, Rammula R, Aarik J Thin Solid Films, 591, 276, 2015 |
| 5 |
Atomic layer deposition of high-quality Al2O3 and Al-doped TiO2 thin films from hydrogen-free precursors Aarik L, Arroval T, Rammula R, Mandar H, Sammelselg V, Hudec B, Husekova K, Frohlich K, Aarik J Thin Solid Films, 565, 19, 2014 |
| 6 |
Influence of process parameters on atomic layer deposition of ZrO2 thin films from CpZr(NMe2)(3) and H2O Aarik L, Alles H, Aidla A, Kahro T, Kukli K, Niinisto J, Mandar H, Tamm A, Rammula R, Sammelselg V, Aarik J Thin Solid Films, 565, 37, 2014 |
| 7 |
Atomic layer deposition of rutile-phase TiO2 on RuO2 from TiCl4 and O-3: Growth of high-permittivity dielectrics with low leakage current Aarik J, Arroval T, Aarik L, Rammula R, Kasikov A, Mandar H, Hudec B, Husekova K, Frohlich K Journal of Crystal Growth, 382, 61, 2013 |
| 8 |
Atomic layer deposition of high-k dielectrics on carbon nanoparticles Tamm A, Peikolainen AL, Kozlova J, Mandar H, Aidla A, Rammula R, Aarik L, Roosalu K, Lu J, Hultman L, Koel M, Kukli K, Aarik J Thin Solid Films, 538, 16, 2013 |
| 9 |
Atomic layer deposition of TiO2 from TiCl4 and O-3 Aarik L, Arroval T, Rammula R, Mandar H, Sammelselg V, Aarik J Thin Solid Films, 542, 100, 2013 |
| 10 |
Chemical resistance of thin film materials based on metal oxides grown by atomic layer deposition Sammelselg V, Netsipailo I, Aidla A, Tarre A, Aarik L, Asari J, Ritslaid P, Aarik J Thin Solid Films, 542, 219, 2013 |