| 1 |
Effects of hydrogen dilution on CNx film properties deposited using rf PECVD from a mixture of ethane, nitrogen and hydrogen
Othman M, Ritikos R, Khanis NH, Rashid NMA, Ab Gani SM, Rahman SA
Materials Chemistry and Physics, 144(3), 377, 2014 |
| 2 |
Catalyst free carbon nitride nanostructures prepared by rf-PECVD technique on hydrogenated amorphous carbon template
Khanis NH, Ritikos R, Othman M, Rashid NMA, Ab Gani SM, Rahman SA
Materials Chemistry and Physics, 138(2-3), 514, 2013 |
| 3 |
Effect of N-2 flow rate on the properties of CNx thin films prepared by radio frequency plasma enhanced chemical vapor deposition from ethane and nitrogen
Othman M, Ritikos R, Khanis NH, Rashid NMA, Ab Gani SM, Rahman SA
Thin Solid Films, 529, 439, 2013 |
| 4 |
Amorphous silicon carbon films prepared by hybrid plasma enhanced chemical vapor/sputtering deposition system: Effects of r.f. power
Rashid NMA, Ritikos R, Othman M, Khanis NH, Ab Gani SM, Muhamad MR, Rahman SA
Thin Solid Films, 529, 459, 2013 |
| 5 |
Effect of pre-deposited carbon layer on the formation of carbon nitride nanostructures prepared by radio-frequency plasma enhanced chemical vapour deposition
Khanis NH, Ritikos R, Othman M, Rashid NMA, Ab Gani SM, Muhamad MR, Rahman SA
Materials Chemistry and Physics, 130(1-2), 218, 2011 |
| 6 |
Effects of rf power on the structural properties of carbon nitride thin films prepared by plasma enhanced chemical vapour deposition
Othman M, Ritikos R, Khanis NH, Rashid NMA, Rahman SA, Ab Gani SM, Muhamad MR
Thin Solid Films, 519(15), 4981, 2011 |
