검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Oxynitridation of silicon with nitrogen plasma for flash memory applications characterized by high frequency capacitance-voltage measurements Ikeda A, Abd Elnaby M, Fujimura T, Hattori R, Kuroki Y Thin Solid Films, 385(1-2), 215, 2001 |
| 2 |
Effect of nitrogen plasma conditions on electrical properties of silicon oxynitrided thin films for flash memory applications Ikeda A, Abd Elnaby M, Hattori R, Kuroki Y Thin Solid Films, 386(1), 111, 2001 |