검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Co-implantation with conventional spike anneal solutions for 45 nm n-type metal-oxide-semiconductor ultra-shallow junction formation Collart EJH, Felch SB, Pawlak BJ, Absil PP, Severi S, Janssens T, Vandervorst W Journal of Vacuum Science & Technology B, 24(1), 507, 2006 |
| 2 |
Characteristics of selective epitaxial SiGe deposition processes for recessed source/drain applications Loo R, Verheyen P, Eneman G, Rooyackers R, Leys F, Shamiryan D, De Meyer K, Absil PP, Caymax M Thin Solid Films, 508(1-2), 266, 2006 |