화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
Lee DJ, Lim JW, Mun JK, Yun SJ
Materials Research Bulletin, 83, 597, 2016
2 Structural and electronic properties of the 6H-SiC(0001)/Al2O3 interface prepared by atomic layer deposition
Seyller T, Gao K, Ley L, Ciobanu F, Pensl G, Tadich A, Riley JD, Leckey RCG
Materials Science Forum, 457-460, 1369, 2004