화학공학소재연구정보센터
검색결과 : 9건
No. Article
1 Anisotropic piezoelectric response of ion beam sputtered aluminum nitride thin films textured along [10(1)over-bar0]-axis: A field dependent X-ray diffraction investigation
Sharma N, Ilango S
Applied Surface Science, 452, 299, 2018
2 X-ray photoelectron spectroscopy studies on AlN thin films grown by ion beam sputtering in reactive assistance of N+/N-2(+) ions: Substrate temperature induced compositional variations
Sharma N, Ilango S, Dash S, Tyagi AK
Thin Solid Films, 636, 626, 2017
3 Structural characterization of AlN films synthesized by pulsed laser deposition
Szekeres A, Fogarassy Z, Petrik P, Vlaikova E, Cziraki A, Socol G, Ristoscu C, Grigorescu S, Mihailescu IN
Applied Surface Science, 257(12), 5370, 2011
4 Frequency dependent conductivity of aluminium nitride films prepared by ion beam-assisted deposition
Lal K, Meikap AK, Chattopadhyay SK, Chatterjee SK, Ghosh P, Ghosh M, Baba K, Hatada R
Thin Solid Films, 434(1-2), 264, 2003
5 Growth of c-axis oriented aluminum nitride films on GaAs substrates by reactive rf magnetron sputtering
Cheng CC, Chen YC, Horng RC, Wang HJ, Chen WR, Lai EK
Journal of Vacuum Science & Technology A, 16(6), 3335, 1998
6 Magnetron sputtering of aluminium using oxygen or nitrogen as reactive gas
Schulte J, Sobe G
Thin Solid Films, 324(1-2), 19, 1998
7 Characteristics of Hydrogenated Aluminum Nitride Films Prepared by Radio-Frequency Reactive Sputtering and Their Application to Surface-Acoustic-Wave Devices
Yong YJ, Lee JY
Journal of Vacuum Science & Technology A, 15(2), 390, 1997
8 Adsorption and Thermal-Decomposition of Hydrazoic Acid on Al(111)
Russell JN, Bermudez VM, Leming A
Langmuir, 12(26), 6492, 1996
9 Reactive Low-Voltage Ion Plating of Aluminum Nitride Films and Their Characteristics
Danh NQ, Monz KH, Pulker HK
Thin Solid Films, 257(1), 116, 1995