검색결과 : 13건
No. | Article |
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1 |
Modeling and Simulation of an Industrial Top-Fired Methane Steam Reforming Unit Quirino PPS, Amaral A, Pontes KV, Rossi F, Manenti F Industrial & Engineering Chemistry Research, 59(24), 11250, 2020 |
2 |
Optical and photoconductive properties of indium sulfide fluoride thin films Vygranenko Y, Vieira M, Lavareda G, de Carvalho CN, Brogueira P, Amaral A, Barradas NP, Alves E Thin Solid Films, 671, 49, 2019 |
3 |
P-type CuxS thin films: Integration in a thin film transistor structure de Carvalho CN, Parreira P, Lavareda G, Brogueira P, Amaral A Thin Solid Films, 543, 3, 2013 |
4 |
Thermal dehydrogenation of amorphous silicon: A time-evolution study Velozo AD, Lavareda G, de Carvalho CN, Amaral A Thin Solid Films, 543, 48, 2013 |
5 |
p/n junction depth control using amorphous silicon as a low temperature dopant source Lavareda G, Velozo AD, de Carvalho CN, Amaral A Thin Solid Films, 543, 122, 2013 |
6 |
Device quality InOx:Sn and InOx thin films deposited at room temperature with different rf-power densities Amaral A, Brogueira P, Conde O, Lavareda G, de Carvalho CN Thin Solid Films, 526, 221, 2012 |
7 |
Positron annihilation studies in amorphous silicon nitride Gordo PM, Naia MD, Gill CL, de Lima AP, Lavareda G, de Carvalho CN, Amaral A, Kajcsos Z Materials Science Forum, 445-6, 90, 2004 |
8 |
Improvement of field-effect mobilities in TFTs: Surface plasma treatments vs stack dielectric structures Lavareda G, de Carvalho CN, Amaral A, Fortunato E Materials Science Forum, 455-456, 64, 2004 |
9 |
Optimisation of a home-made RIE system - Effect of SF6 plasma on the properties of partially etched a-Si : H films Pereira P, Lavareda G, do Rego AMB, Amaral A, de Carvalho CN Materials Science Forum, 455-456, 124, 2004 |
10 |
Dependence of TFT performance on the dielectric characteristics Lavareda G, de Carvalho CN, Amaral A, Fortunato E, Ramos AR, da Silva ME Thin Solid Films, 427(1-2), 71, 2003 |