화학공학소재연구정보센터
검색결과 : 13건
No. Article
1 Modeling and Simulation of an Industrial Top-Fired Methane Steam Reforming Unit
Quirino PPS, Amaral A, Pontes KV, Rossi F, Manenti F
Industrial & Engineering Chemistry Research, 59(24), 11250, 2020
2 Optical and photoconductive properties of indium sulfide fluoride thin films
Vygranenko Y, Vieira M, Lavareda G, de Carvalho CN, Brogueira P, Amaral A, Barradas NP, Alves E
Thin Solid Films, 671, 49, 2019
3 P-type CuxS thin films: Integration in a thin film transistor structure
de Carvalho CN, Parreira P, Lavareda G, Brogueira P, Amaral A
Thin Solid Films, 543, 3, 2013
4 Thermal dehydrogenation of amorphous silicon: A time-evolution study
Velozo AD, Lavareda G, de Carvalho CN, Amaral A
Thin Solid Films, 543, 48, 2013
5 p/n junction depth control using amorphous silicon as a low temperature dopant source
Lavareda G, Velozo AD, de Carvalho CN, Amaral A
Thin Solid Films, 543, 122, 2013
6 Device quality InOx:Sn and InOx thin films deposited at room temperature with different rf-power densities
Amaral A, Brogueira P, Conde O, Lavareda G, de Carvalho CN
Thin Solid Films, 526, 221, 2012
7 Positron annihilation studies in amorphous silicon nitride
Gordo PM, Naia MD, Gill CL, de Lima AP, Lavareda G, de Carvalho CN, Amaral A, Kajcsos Z
Materials Science Forum, 445-6, 90, 2004
8 Improvement of field-effect mobilities in TFTs: Surface plasma treatments vs stack dielectric structures
Lavareda G, de Carvalho CN, Amaral A, Fortunato E
Materials Science Forum, 455-456, 64, 2004
9 Optimisation of a home-made RIE system - Effect of SF6 plasma on the properties of partially etched a-Si : H films
Pereira P, Lavareda G, do Rego AMB, Amaral A, de Carvalho CN
Materials Science Forum, 455-456, 124, 2004
10 Dependence of TFT performance on the dielectric characteristics
Lavareda G, de Carvalho CN, Amaral A, Fortunato E, Ramos AR, da Silva ME
Thin Solid Films, 427(1-2), 71, 2003