검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Room temperature wafer bonding using oxygen plasma treatment in reactive ion etchers with and without inductively coupled plasma Sanz-Velasco A, Amirfeiz P, Bengtsson S, Colinge C Journal of the Electrochemical Society, 150(2), G155, 2003 |
| 2 |
Formation of silicon structures by plasma-activated wafer bonding Amirfeiz P, Bengtsson S, Bergh M, Zanghellini E, Borjesson L Journal of the Electrochemical Society, 147(7), 2693, 2000 |