검색결과 : 40건
| No. | Article |
|---|---|
| 1 |
Recent developments in surface science and engineering, thin films, nanoscience, biomaterials, plasma science, and vacuum technology Mozetic M, Vesel A, Primc G, Eisenmenger-Sittner C, Bauer J, Eder A, Schmid GHS, Ruzic DN, Ahmed Z, Barker D, Douglass KO, Eckel S, Fedchak JA, Hendricks J, Klimov N, Ricker J, Scherschligt J, Stone J, Strouse G, Capan I, Buljan M, Milosevic S, Teichert C, Cohen SR, Silva AG, Lehocky M, Humpolicek P, Rodriguez C, Hernandez-Montelongo J, Mercier D, Manso-Silvan M, Ceccone G, Galtayries A, Stana-Kleinschek K, Petrov I, Greene JE, Avila J, Chen CY, Caja-Munoz B, Yi H, Boury A, Lorcy S, Asensio MC, Bredin J, Gans T, O'Connell D, Brendin J, Reniers F, Vincze A, Anderle M, Montelius L Thin Solid Films, 660, 120, 2018 |
| 2 |
Public antibodies to malaria antigens generated by two LAIR1 insertion modalities Pieper K, Tan J, Piccoli L, Foglierini M, Barbieri S, Chen YW, Silacci-Fregni C, Wolf T, Jarrossay D, Anderle M, Abdi A, Ndungu FM, Doumbo OK, Traore B, Tran TM, Jongo S, Zenklusen I, Crompton PD, Daubenberger C, Bull PC, Allusto FS, Lanzavecchia A Nature, 548(7669), 597, 2017 |
| 3 |
XPS, SIMS and FTIR-ATR characterization of boronized graphite from the thermonuclear plasma device RFX-mod Ghezzi F, Laguardia L, Caniello R, Canton A, Dal Bello S, Rais B, Anderle M Applied Surface Science, 354, 408, 2015 |
| 4 |
Deuterium depth profile quantification in a ASDEX Upgrade divertor tile using secondary ion mass spectrometry Ghezzi F, Caniello R, Giubertoni D, Bersani M, Hakola A, Mayer M, Rohde V, Anderle M Applied Surface Science, 315, 459, 2014 |
| 5 |
Organo-silane coated substrates for DNA purification Pasquardini L, Lunelli L, Potrich C, Marocchi L, Fiorilli S, Vozzi D, Vanzetti L, Gasparini P, Anderle M, Pederzolli C Applied Surface Science, 257(24), 10821, 2011 |
| 6 |
Advanced LMI based analysis and design for Acrobot walking Anderle M, Celikovsky S, Henrion D, Zikmund J International Journal of Control, 83(8), 1641, 2010 |
| 7 |
Influence of C4F8/Ar-based etching and H-2-based remote plasma ashing processes on ultralow k materials modifications Kuo MS, Hua XF, Oehrlein GS, Ali A, Jiang P, Lazzeri P, Anderle M Journal of Vacuum Science & Technology B, 28(2), 284, 2010 |
| 8 |
Mechanistic study of ultralow k-compatible carbon dioxide in situ photoresist ashing processes. I. Process performance and influence on ULK material modification Kuo MS, Pal AR, Oehrlein GS, Lazzeri P, Anderle M Journal of Vacuum Science & Technology B, 28(5), 952, 2010 |
| 9 |
Interactions of photoresist stripping plasmas with nanoporous organo-silicate ultra low dielectric constant dielectrics Lazzeri P, Oehrlein GS, Stueber GJ, McGowan R, Busch E, Pederzoli S, Jeynes C, Bersani M, Anderle M Thin Solid Films, 516(11), 3697, 2008 |
| 10 |
Plasma enhanced chemical vapor deposition of a-C : H films in CH4-CO2 plasma: Gas composition and substrate biasing effects on the film structure and growth process Gottardi G, Laidani N, Bartali R, Micheli V, Anderle M Thin Solid Films, 516(12), 3910, 2008 |