화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Comparative study of Cl-2, Cl-2/O-2, and Cl-2/N-2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP
Carlstrom CF, van der Heijden R, Andriesse MSP, Karouta F, van der Heijden RW, van der Drift E, Salemink HWM
Journal of Vacuum Science & Technology B, 26(5), 1675, 2008
2 Magnetization losses in submicrometer CoFeB dots etched in a high ion density Cl-2-based plasma
Fabrie CGCHM, Kohlhepp JT, Swagten HJM, Koopmans B, Andriesse MSP, van der Drift E
Journal of Vacuum Science & Technology B, 24(6), 2627, 2006
3 High speed, dry etching of Fe for integration of magnetic devices in microelectronics
Andriesse MSP, van der Drift E, Sloof WG
Journal of Vacuum Science & Technology B, 19(6), 2901, 2001