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| No. | Article |
|---|---|
| 1 |
Fabrication of nanowires with high aspect ratios utilized by dry etching with SF(6):C(4)F(8) and self-limiting thermal oxidation on Si substrate Park SY, Di Giacomo SJ, Anisha R, Berger PR, Thompson PE, Adesida I Journal of Vacuum Science & Technology B, 28(4), 763, 2010 |