검색결과 : 2건
No. | Article |
---|---|
1 |
The effect of Ar flow rate in the growth of SiGe:H thin films by PECVD Tang ZG, Wang WB, Wang DS, Liu DQ, Liu QM, Yin M, He DY Applied Surface Science, 256(23), 7032, 2010 |
2 |
The influence of H-2/(H-2 + Ar) ratio on microstructure and optoelectronic properties of microcrystalline silicon films deposited by plasma-enhanced CVD Tang ZG, Wang WB, Zhou B, Wang DS, Peng SL, He DY Applied Surface Science, 255(21), 8867, 2009 |