화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 The effect of Ar flow rate in the growth of SiGe:H thin films by PECVD
Tang ZG, Wang WB, Wang DS, Liu DQ, Liu QM, Yin M, He DY
Applied Surface Science, 256(23), 7032, 2010
2 The influence of H-2/(H-2 + Ar) ratio on microstructure and optoelectronic properties of microcrystalline silicon films deposited by plasma-enhanced CVD
Tang ZG, Wang WB, Zhou B, Wang DS, Peng SL, He DY
Applied Surface Science, 255(21), 8867, 2009