검색결과 : 5건
No. | Article |
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1 |
Experimental and theoretical study of ion distributions near 300 mu m tall steps on rf-biased wafers in high density plasmas Woodworth JR, Miller PA, Shul RJ, Abraham IC, Aragon BP, Hamilton TW, Willison CG, Kim D, Economou DJ Journal of Vacuum Science & Technology A, 21(1), 147, 2003 |
2 |
Ion energy distributions at rf-biased wafer surfaces Woodworth JR, Abraham IC, Riley ME, Miller PA, Hamilton TW, Aragon BP, Shul RJ, Willison CG Journal of Vacuum Science & Technology A, 20(3), 873, 2002 |
3 |
Ion energy distributions versus frequency and ion mass at the rf-biased electrode in an inductively driven discharge Abraham IC, Woodworth JR, Riley ME, Miller PA, Hamilton TW, Aragon BP Journal of Vacuum Science & Technology A, 20(5), 1759, 2002 |
4 |
Absolute intensities of the vacuum ultraviolet spectra in oxide etch plasma processing discharges Woodworth JR, Riley ME, Arnatucci VA, Hamilton TW, Aragon BP Journal of Vacuum Science & Technology A, 19(1), 45, 2001 |
5 |
Absolute intensities of the vacuum ultraviolet spectra in a metal-etch plasma processing discharge Woodworth JR, Blain MG, Jarecki RL, Hamilton TW, Aragon BP Journal of Vacuum Science & Technology A, 17(6), 3209, 1999 |