화학공학소재연구정보센터
검색결과 : 14건
No. Article
1 Atomic Layer Deposition of LiCoO2 Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries
Donders ME, Arnoldbik WM, Knoops HCM, Kessels WMM, Notten PHL
Journal of the Electrochemical Society, 160(5), A3066, 2013
2 The effect of composition on the bond structure and refractive index of silicon nitride deposited by HWCVD and PECVD
Verlaan V, Verkerk AD, Arnoldbik WM, van der Werf CHM, Bakker R, Houweling ZS, Romijn IG, Borsa DM, Weeber AW, Luxembourg SL, Zeman M, Dekkers HFW, Schropp REI
Thin Solid Films, 517(12), 3499, 2009
3 On the argon and oxygen incorporation into SiOx through ion implantation during reactive plasma magnetron sputter deposition
van Hattum ED, Boltje DB, Palmero A, Arnoldbik WM, Rudolph H, Habraken FHPM
Applied Surface Science, 255(5), 3079, 2008
4 On-line characterisation of radiofrequency magnetron sputter deposition of SiOx using elastic recoil detection
van Hattum ED, Arnoldbik WM, Palmero A, Habraken FHPM
Thin Solid Films, 494(1-2), 13, 2006
5 Silicon nitride at high deposition rate by Hot Wire Chemical Vapor Deposition as passivating and antireflection layer on multi crystalline silicon solar cells
van der Werf CHM, Goldbach HD, Loffler J, Scarfo A, Kylner AMC, Stannowski B, ArnoldBik WM, Weeber A, Rieffe H, Soppe WJ, Rath JK, Schropp REI
Thin Solid Films, 501(1-2), 51, 2006
6 Improving the control of the electroless plating synthesis of Pd/Ag membranes for hydrogen separation using Rutherford backscattering
Witjens LC, Bitter JH, van Dillen AJ, Arnoldbik WM, Habraken FHPM, de Jong KP
Journal of Membrane Science, 254(1-2), 241, 2005
7 Thickness determination of thin (similar to 20 nm) microcrystalline silicon layers
Gordijn A, Loffler J, Arnoldbik WM, Tichelaar FD, Rath JK, Schropp REI
Solar Energy Materials and Solar Cells, 87(1-4), 445, 2005
8 Computer-aided band gap engineering and experimental verification of amorphous silicon-germanium solar cells
Zambrano RJ, Rubinelli FA, Arnoldbik WM, Rath JK, Schropp REI
Solar Energy Materials and Solar Cells, 81(1), 73, 2004
9 Study of the a-Si/a-SiO2 interface deposited by r.f. magnetron sputtering
Tomozeiu N, van Faassen EE, Palmero A, Arnoldbik WM, Vredenberg AM, Habraken FHPM
Thin Solid Films, 447, 306, 2004
10 Influence of the high-temperature "firing" step on high-rate plasma deposited silicon nitride films used as bulk passivating antireflection coatings on silicon solar cells
Hong J, Kessels WMM, Soppe WJ, Weeber AW, Arnoldbik WM, van de Sanden MCM
Journal of Vacuum Science & Technology B, 21(5), 2123, 2003