화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Structure and properties of silicon oxide films deposited in a dual microwave-rf plasma reactor
Benissad N, Aumaille K, Granier A, Goullet A
Thin Solid Films, 384(2), 230, 2001
2 A comparative study of oxygen/organosilicon plasmas and thin SiOxCyHz films deposited in a helicon reactor
Aumaille K, Vallee C, Granier A, Goullet A, Gaboriau F, Turban G
Thin Solid Films, 359(2), 188, 2000
3 Experimental investigation of the respective roles of oxygen atoms and electrons in the deposition of SiO2 in O-2/TEOS helicon plasmas
Granier A, Vallee C, Goullet A, Aumaille K, Turban G
Journal of Vacuum Science & Technology A, 17(5), 2470, 1999