검색결과 : 3건
No. | Article |
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1 |
Ion and neutral transportation consideration in etching of thin Si3N4 in high aspect ratio structures for aspect ratio independent etching Bai KH, Chi KK, Kim MC Journal of Vacuum Science & Technology B, 24(3), 1292, 2006 |
2 |
Substrate temperature effects on 193 nm photoresist deformation and self-aligned contact hole etching performances Kim MC, Bai KH, Kang CJ, Cho HK Journal of Vacuum Science & Technology B, 24(5), 2331, 2006 |
3 |
Control of electron density and temperature with a modified capacitive discharge You SJ, Bai KH, Chae SH, Chang HY Plasma Chemistry and Plasma Processing, 25(3), 245, 2005 |