화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Ion and neutral transportation consideration in etching of thin Si3N4 in high aspect ratio structures for aspect ratio independent etching
Bai KH, Chi KK, Kim MC
Journal of Vacuum Science & Technology B, 24(3), 1292, 2006
2 Substrate temperature effects on 193 nm photoresist deformation and self-aligned contact hole etching performances
Kim MC, Bai KH, Kang CJ, Cho HK
Journal of Vacuum Science & Technology B, 24(5), 2331, 2006
3 Control of electron density and temperature with a modified capacitive discharge
You SJ, Bai KH, Chae SH, Chang HY
Plasma Chemistry and Plasma Processing, 25(3), 245, 2005