화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Self-Assembled Monolayers Exposed by Metastable Argon and Metastable Helium for Neutral Atom Lithography and Atomic-Beam Imaging
Bard A, Berggren KK, Wilbur JL, Gillaspy JD, Rolston SL, Mcclelland JJ, Phillips WD, Prentiss M, Whitesides GM
Journal of Vacuum Science & Technology B, 15(5), 1805, 1997
2 Microlithography by Using Neutral Metastable Atoms and Self-Assembled Monolayers
Berggren KK, Bard A, Wilbur JL, Gillaspy JD, Helg AG, Mcclelland JJ, Rolston SL, Phillips WD, Prentiss M, Whitesides GM
Science, 269(5228), 1255, 1995