검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Al2O3-SiO2 stack with enhanced reliability Lisiansky M, Fenigstein A, Heiman A, Raskin Y, Roizin Y, Bartholomew L, Owyang J, Gladkikh A, Brener R, Geppert I, Lyakin E, Meyler B, Shnieder Y, Yofis S, Eizenberg M Journal of Vacuum Science & Technology B, 27(1), 476, 2009 |
| 2 |
Atomic layer deposition of hafnium oxide and hafnium silicate thin films using liquid precursors and ozone Senzaki Y, Park S, Chatham H, Bartholomew L, Nieveen W Journal of Vacuum Science & Technology A, 22(4), 1175, 2004 |
| 3 |
Equivalent oxide thickness reduction of interpoly dielectric using ALD-Al2O3 for flash device application Lee TP, Jang C, Haselden B, Dong M, Park S, Bartholomew L, Chatham H, Senzaki Y Journal of Vacuum Science & Technology B, 22(5), 2295, 2004 |
| 4 |
Optimization of SiO2 Film Conformality in Teos/O-3 APCVD Yuan Z, Mokhtari S, Ferdinand A, Eakin J, Bartholomew L Thin Solid Films, 290-291, 422, 1996 |