검색결과 : 2건
No. | Article |
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1 |
SiGe channels for V-T control of high-k metal gate transistors for 32 nm complementary metal oxide semiconductor technology and beyond Reichel C, Schoenekess J, Kronholz S, Beernink G, Zeun A, Dietel A, Kammler T Thin Solid Films, 520(8), 3170, 2012 |
2 |
Control of topography and morphology for channel SiGe by in-situ HCl etching for future CMOS technologies with high-K metal gate Reichel C, Kronholz S, Kammler T, Zeun A, Beernink G Solid-State Electronics, 60(1), 134, 2011 |