검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Electrical properties of cobalt and copper contamination in processed silicon Benton JL, Boone T, Jacobson DC, Silverman PJ, Rosamilia JM, Rafferty CS, Weinzierl S, Vu B Journal of the Electrochemical Society, 148(6), G326, 2001 |
| 2 |
Behavior of molybdenum in silicon evaluated for integrated circuit processing Benton JL, Jacobson DC, Jackson B, Johnson JA, Boone T, Eaglesham DJ, Stevie FA, Becerro J Journal of the Electrochemical Society, 146(5), 1929, 1999 |
| 3 |
The Mechanisms of Iron Gettering in Silicon by Boron Ion-Implantation Benton JL, Stolk PA, Eaglesham DJ, Jacobson DC, Cheng JY, Poate JM, Myers SM, Haynes TE Journal of the Electrochemical Society, 143(4), 1406, 1996 |
| 4 |
Comparison of Advanced Plasma Sources for Etching Applications .4. Plasma-Induced Damage in a Helicon and a Multipole Electron-Cyclotron-Resonance Source Blayo N, Tepermeister I, Benton JL, Higashi GS, Boone T, Onuoha A, Klemens FP, Ibbotson DE, Sawin HH Journal of Vacuum Science & Technology B, 12(3), 1340, 1994 |