검색결과 : 11건
| No. | Article |
|---|---|
| 1 |
Characterizing GHOST proximity effect correction effectiveness by determining the worst-case error Watson GP, Berger SD, Liddle JA Journal of Vacuum Science & Technology B, 16(6), 3256, 1998 |
| 2 |
High Emittance Electron-Gun for Projection Lithography Devore W, Berger SD Journal of Vacuum Science & Technology B, 14(6), 3764, 1996 |
| 3 |
Preliminary-Results from a Prototype Projection Electron-Beam Stepper-Scattering with Angular Limitation Projection Electron-Beam Lithography Proof-of-Concept System Harriott LR, Berger SD, Biddick C, Blakey MI, Bowler SW, Brady K, Camarda RM, Connelly WF, Crorken A, Custy J, Dimarco R, Farrow RC, Felker JA, Fetter L, Freeman R, Hopkins L, Huggins HA, Knurek CS, Kraus JS, Liddle JA, Mkrtychan M, Novembre AE, Peabody ML, Tarascon RG, Wade HH, Waskiewicz WK, Watson GP, Werder KS, Windt D Journal of Vacuum Science & Technology B, 14(6), 3825, 1996 |
| 4 |
Measurement of the Backscatter Coefficient Using Resist Response Curves for 20-100 keV Electron-Beam Lithography on Si Watson GP, Fu D, Berger SD, Tennant D, Fetter L, Novembre A, Biddick C Journal of Vacuum Science & Technology B, 14(6), 4277, 1996 |
| 5 |
Space-Charge Effects in Projection Charged-Particle Lithography Systems Harriott LR, Berger SD, Liddle JA, Watson GP, Mkrtchyan MM Journal of Vacuum Science & Technology B, 13(6), 2404, 1995 |
| 6 |
A Background Dose Proximity Effect Correction Technique for Scattering with Angular Limitation Projection Electron Lithography Implemented in Hardware Watson GP, Berger SD, Liddle JA, Waskiewicz WK Journal of Vacuum Science & Technology B, 13(6), 2504, 1995 |
| 7 |
Precise Measurement of the Effective Backscatter Coefficient for 100-keV Electron-Beam Lithography on Si Watson GP, Berger SD, Liddle JA, Fetter LA, Farrow RC, Tarascon RG, Mkrtchyan M, Novembre AE, Blakey MI, Bolan KJ, Poli L Journal of Vacuum Science & Technology B, 13(6), 2535, 1995 |
| 8 |
Lithographic Performance of a Negative Resist Under Scattering with Angular Limitation for Projection Electron Lithography Exposure at 100 keV Tarascon RG, Bolan K, Blakey M, Camarda RM, Farrow RC, Fetter LA, Huggins HA, Kraus JS, Liddle JA, Mixon DA, Novembre AE, Watson GP, Berger SD Journal of Vacuum Science & Technology B, 12(6), 3444, 1994 |
| 9 |
An Analytical Model of Stochastic Interaction Effects in Projection Systems Using a Nearest-Neighbor Approach Mkrtchyan MM, Liddle JA, Berger SD, Harriott LR, Schwartz AM, Gibson JM Journal of Vacuum Science & Technology B, 12(6), 3508, 1994 |
| 10 |
Marks for Alignment and Registration in Projection Electron Lithography Farrow RC, Liddle JA, Berger SD, Huggins HA, Kraus JS, Camarda RM, Tarascon RG, Jurgensen CW, Kola RR, Fetter L Journal of Vacuum Science & Technology B, 11(6), 2175, 1993 |