검색결과 : 19건
No. | Article |
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1 |
Control of stoichiometry and morphology in polycrystalline V(2)O(3)thin films using oxygen buffers Rupp JAJ, Corraze B, Besland MP, Cario L, Tranchant J, Wouters DJ, Waser R, Janod E Journal of Materials Science, 55(30), 14717, 2020 |
2 |
Structural and dielectric characterization of sputtered Tantalum Titanium Oxide thin films for high temperature capacitor applications Rouahi A, Challali F, Dakhlaoui I, Vallee C, Salimy S, Jomni F, Yangui B, Besland MP, Goullet A, Sylvestre A Thin Solid Films, 606, 127, 2016 |
3 |
Metal-insulator transitions in (V1-xCrx)(2)O-3 thin films deposited by reactive direct current magnetron co-sputtering Querre M, Janod E, Cario L, Tranchant J, Corraze B, Bouquet V, Deputier S, Cordier S, Guilloux-Viry M, Besland MP Thin Solid Films, 617, 56, 2016 |
4 |
Resistive Switching in Mott Insulators and Correlated Systems Janod E, Tranchant J, Corraze B, Querre M, Stoliar P, Rozenberg M, Cren T, Roditchev D, Phuoc VT, Besland MP, Cario L Advanced Functional Materials, 25(40), 6287, 2015 |
5 |
Investigation of copper indium gallium selenide material growth by selenization of metallic precursors Han JF, Liao C, Jiang T, Xie HM, Zhao K, Besland MP Journal of Crystal Growth, 382, 56, 2013 |
6 |
Deposition by radio frequency magnetron sputtering of GaV4S8 thin films for resistive random access memory application Souchier E, Besland MP, Tranchant J, Corraze B, Moreau P, Retoux R, Estournes C, Mazoyer P, Cario L, Janod E Thin Solid Films, 533, 54, 2013 |
7 |
Electrical characterizations of resistive random access memory devices based on GaV4S8 thin layers Tranchant J, Janod E, Cario L, Corraze B, Souchier E, Leclercq JL, Cremillieu P, Moreau P, Besland MP Thin Solid Films, 533, 61, 2013 |
8 |
An optimized In-CuGa metallic precursors for chalcopyrite thin films Han JF, Liao C, Jiang T, Xie HM, Zhao K, Besland MP Thin Solid Films, 545, 251, 2013 |
9 |
Investigation of BST thin films deposited by RF magnetron sputtering in pure Argon Challali F, Besland MP, Benzeggouta D, Borderon C, Hugon MC, Salimy S, Saubat JC, Charpentier A, Averty D, Goullet A, Landesman JP Thin Solid Films, 518(16), 4619, 2010 |
10 |
Microstructure and mechanical properties of AlN films obtained by plasma enhanced chemical vapor deposition Sanchez G, Abdallah B, Tristant P, Dublanche-Tixier C, Djouadi MA, Besland MP, Jouan PY, Alles AB Journal of Materials Science, 44(22), 6125, 2009 |