검색결과 : 6건
No. | Article |
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1 |
SCALPEL aerial image monitoring: Principles and application to space charge Gallatin GM, Farrow RC, Liddle JA, Waskiewicz WK, Mkrtchyan MM, Orphanos P, Felker J, Kraus J, Biddick CJ, Stanton S, Novembre AE, Blakey M Journal of Vacuum Science & Technology B, 18(5), 2560, 2000 |
2 |
Shape engineering: A novel optical proximity correction technique for attenuated phase-shift mask Pau S, Bolan K, Blakey M, Nalamasu O Journal of Vacuum Science & Technology B, 18(6), 2896, 2000 |
3 |
Commercialization of SCALPEL masks Farrow RC, Novembre AE, Peabody M, Kasica R, Blakey M, Liddle JA, Werder K, DeMarco R, Ocola L, Rutberg L, Saunders T, Unruh J, Qian F, Smith M Journal of Vacuum Science & Technology B, 16(6), 3582, 1998 |
4 |
Application of transmission electron detection to SCALPEL mask metrology Farrow RC, Postek MT, Keery WJ, Jones SN, Lowney JR, Blakey M, Fetter LA, Griffith JE, Liddle JA, Hopkins LC, Huggins HA, Peabody M, Novembre A Journal of Vacuum Science & Technology B, 15(6), 2167, 1997 |
5 |
Lithographic Evaluation of a Positive-Acting Chemically Amplified Resist System Under Conventional and Projection Electron-Beam Exposures Tarascon RG, Novembre AE, Bolan K, Blakey M, Knurek C, Fetter L, Huggins HA, Liddle JA, Nalamasu O Journal of Vacuum Science & Technology B, 13(6), 2975, 1995 |
6 |
Lithographic Performance of a Negative Resist Under Scattering with Angular Limitation for Projection Electron Lithography Exposure at 100 keV Tarascon RG, Bolan K, Blakey M, Camarda RM, Farrow RC, Fetter LA, Huggins HA, Kraus JS, Liddle JA, Mixon DA, Novembre AE, Watson GP, Berger SD Journal of Vacuum Science & Technology B, 12(6), 3444, 1994 |