검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Real-Time Ultraviolet Ellipsometry Monitoring of Gate Patterning in a High-Density Plasma Vallon S, Joubert O, Vallier L, Ferrieu F, Drevillon B, Blayo N Journal of Vacuum Science & Technology A, 15(3), 865, 1997 |
| 2 |
Plasma-Etching Process-Development Using in-Situ Optical-Emission and Ellipsometry Lee JT, Blayo N, Tepermeister I, Klemens FP, Mansfield WM, Ibbotson DE Journal of Vacuum Science & Technology B, 14(5), 3283, 1996 |
| 3 |
Comparison of Advanced Plasma Sources for Etching Applications .4. Plasma-Induced Damage in a Helicon and a Multipole Electron-Cyclotron-Resonance Source Blayo N, Tepermeister I, Benton JL, Higashi GS, Boone T, Onuoha A, Klemens FP, Ibbotson DE, Sawin HH Journal of Vacuum Science & Technology B, 12(3), 1340, 1994 |
| 4 |
Comparison of Advanced Plasma Sources for Etching Applications .1. Etching Rate, Uniformity, and Profile Control in a Helicon and a Multiple Electron-Cyclotron-Resonance Source Tepermeister I, Blayo N, Klemens FP, Ibbotson DE, Gottscho RA, Lee JT, Sawin HH Journal of Vacuum Science & Technology B, 12(4), 2310, 1994 |