검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Progress in extreme ultraviolet interferometric and holographic lithography Isoyan A, Cheng YC, Jiang F, Wallace J, Cerrinab F, Bollepalli S Journal of Vacuum Science & Technology B, 25(6), 2145, 2007 |
| 2 |
Revisiting phase shifting masks in x-ray lithography Khan M, Bollepalli S, Cerrina F Journal of Vacuum Science & Technology B, 15(6), 2255, 1997 |
| 3 |
X-ray lithography for <= 100 nm ground rules in complex patterns Hector S, Pol V, Krasnoperova A, Maldonado J, Flamholz A, Heald D, Stahlhammer C, Galburt D, Amodeo R, Donohue T, Wind S, Buchigniano J, Viswanathan R, Khan M, Bollepalli S, Cerrina F Journal of Vacuum Science & Technology B, 15(6), 2517, 1997 |
| 4 |
Extendibility of X-Ray-Lithography to Less-Than-or-Equal-to-130 nm Ground Rules in Complex Integrated-Circuit Patterns Hector S, Chu W, Thompson M, Pol V, Dauksher B, Cummings K, Resnick D, Pendharkar S, Maldonado J, Mccord M, Krasnoperova A, Liebmann L, Silverman J, Guo J, Khan M, Bollepalli S, Capodieci L, Cerrina F Journal of Vacuum Science & Technology B, 14(6), 4288, 1996 |