검색결과 : 6건
| No. | Article |
|---|---|
| 1 |
Surface kinetics model for SiLK chemical mechanical polishing Borst CL, Thakurta DG, Gill WN, Gutmann RJ Journal of the Electrochemical Society, 149(2), G118, 2002 |
| 2 |
Three-dimensional chemical mechanical planarization slurry flow model based on lubrication theory Thakurta DG, Borst CL, Schwendeman DW, Gutmann RJ, Gill WN Journal of the Electrochemical Society, 148(4), G207, 2001 |
| 3 |
Chemical-mechanical polishing of SiOC organosilicate glasses: the effect of film carbon content Borst CL, Korthuis V, Shinn GB, Luttmer JD, Gutmann RJ, Gill WN Thin Solid Films, 385(1-2), 281, 2001 |
| 4 |
Pad porosity, compressibility and slurry delivery effects in chemical-mechanical planarization: modeling and experiments Thakurta DG, Borst CL, Schwendeman DW, Gutmann RJ, Gill WN Thin Solid Films, 366(1-2), 181, 2000 |
| 5 |
Chemical mechanical polishing mechanisms of low dielectric constant polymers in copper slurries Borst CL, Thakurta DG, Gill WN, Gutmann RJ Journal of the Electrochemical Society, 146(11), 4309, 1999 |
| 6 |
Temperature effects on equilibrium and mass transfer of phenylalanine in cation exchangers Borst CL, Grzegorczyk DS, Strand SJ, Carta G Reactive & Functional Polymers, 32(1), 25, 1997 |