검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Radiative wafer heating during plasma deposition process Bosch RCM, Kant CH, van Erven AJM, Stals WTM, Bijker MD Journal of Vacuum Science & Technology A, 25(3), 508, 2007 |
| 2 |
Influence of reactor wall conditions on etch processes in inductively coupled fluorocarbon plasmas Schaepkens M, Bosch RCM, Standaert TEFM, Oehrlein GS, Cook JM Journal of Vacuum Science & Technology A, 16(4), 2099, 1998 |