화학공학소재연구정보센터
검색결과 : 12건
No. Article
1 A Short Review of Experimental and Computational Diagnostics for Radiofrequency Plasma Micro-thrusters
Charles C, Bish A, Boswell RW, Dedrick J, Greig A, Hawkins R, Ho TS
Plasma Chemistry and Plasma Processing, 36(1), 29, 2016
2 Nanocrystalline Diamond Thin Films Synthesis on Curved Surface
Li DS, Qin QH, Zuo DW, Boswell RW, Lu WZ, Stachurski Z
Plasma Chemistry and Plasma Processing, 34(4), 767, 2014
3 Platinum nanocluster growth on vertically aligned carbon nanofiber arrays: Sputtering experiments and molecular dynamics simulations
Brault P, Caillard A, Charles C, Boswell RW, Graves DB
Applied Surface Science, 263, 352, 2012
4 High brightness inductively coupled plasma source for high current focused ion beam applications
Smith NS, Skoczylas WP, Kellogg SM, Kinion DE, Tesch PP, Sutherland O, Aanesland A, Boswell RW
Journal of Vacuum Science & Technology B, 24(6), 2902, 2006
5 Low temperature pulsed etching of large glass substrates
Dubost L, Bellinger A, Perrin J, Boswell RW
Journal of Vacuum Science & Technology A, 21(4), 892, 2003
6 Etching silicon by SF6 in a continuous and pulsed power helicon reactor
Herrick A, Perry AJ, Boswell RW
Journal of Vacuum Science & Technology A, 21(4), 955, 2003
7 Papers presented at the joint symposium: The 11th Symposium on Plasma Science for Materials and the 4th Asia-Pacific Conference on Plasma Science & Technology, Coogee, Sydney, NSW, Australia, 27-29 July 1998 - Preface
Yoshida T, Boswell RW, Koinuma H, Lowke J
Thin Solid Films, 345(1), VII, 1999
8 Investigation of a SF6 helicon plasma
Chabert P, Boswell RW, Davis C
Journal of Vacuum Science & Technology A, 16(1), 78, 1998
9 Sharp edged silicon structures generated using atom lithography with metastable helium atoms
Lu WJ, Baldwin KGH, Hoogerland MD, Buckman SJ, Senden TJ, Sheridan TE, Boswell RW
Journal of Vacuum Science & Technology B, 16(6), 3846, 1998
10 X-Ray Photoelectron Study of the Reactive Ion Etching of Sixge1-X Alloys in SF6 Plasmas
Peignon MC, Cardinaud C, Turban G, Charles C, Boswell RW
Journal of Vacuum Science & Technology A, 14(1), 156, 1996