검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Fluorinated Acid Amplifiers for EUV Lithography Kruger S, Revuru S, Higgins C, Gibbons S, Freedman DA, Yueh W, Younkin TR, Brainard RL Journal of the American Chemical Society, 131(29), 9862, 2009 |
| 2 |
Resist effects at small pitches Van Steenwinckel D, Lammers JH, Koehler T, Brainard RL, Trefonas P Journal of Vacuum Science & Technology B, 24(1), 316, 2006 |
| 3 |
Measuring acid generation efficiency in chemically amplified resists with all three beams Szmanda CR, Brainard RL, Mackevich JF, Awaji A, Tanaka T, Yamada Y, Bohland J, Tedesco S, Dal'Zotto B, Bruenger W, Torkler M, Fallmann W, Loeschner H, Kaesmaier R, Nealey PM, Pawloski AR Journal of Vacuum Science & Technology B, 17(6), 3356, 1999 |
| 4 |
Comparison of the lithographic properties of positive resists upon exposure to deep- and extreme-ultraviolet radiation Brainard RL, Henderson C, Cobb J, Rao V, Mackevich JF, Okoroanyanwu U, Gunn S, Chambers J, Connolly S Journal of Vacuum Science & Technology B, 17(6), 3384, 1999 |