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| No. | Article |
|---|---|
| 1 |
Low-Temperature (Less-Than-or-Equal-to-600-Degrees-C) Semiinsulating Oxygen-Doped Silicon Films by the PECVD Technique for Large-Area Power Applications Clough FJ, Brown AO, Madathil SN, Milne WI Thin Solid Films, 270(1-2), 517, 1995 |