검색결과 : 8건
| No. | Article |
|---|---|
| 1 |
Nanopatterning of magnetic disks by single-step Ar+ ion projection Dietzel A, Berger R, Loeschner H, Platzgummer E, Stengl G, Bruenger WH, Letzkus F Advanced Materials, 15(14), 1152, 2003 |
| 2 |
Fabrication and electrical characteristics of carbon nanotube-based microcathodes for use in a parallel electron-beam lithography system Teo KBK, Chhowalla M, Amaratunga GAJ, Milne WI, Legagneux P, Pirio G, Gangloff L, Pribat D, Semet V, Binh VT, Bruenger WH, Eichholz J, Hanssen H, Friedrich D, Lee SB, Hasko DG, Ahmed H Journal of Vacuum Science & Technology B, 21(2), 693, 2003 |
| 3 |
Ion projection sensitized selective Cu electroplating on uncoated p-Si Spiegel A, Bruenger WH, Dzionk C, Schmuki P Journal of Vacuum Science & Technology B, 20(6), 2713, 2002 |
| 4 |
Minimum ion-beam exposure-dose determination for chemically amplified resist from printed dot matrices Bruenger WH, Torkler M, Weiss M, Loschner H, Leung K, Lee Y, Hudek P, Rangelow IW, Stangl G, Fallmann W Journal of Vacuum Science & Technology B, 17(6), 3119, 1999 |
| 5 |
Contamination reduction in low voltage electron-beam microscopy for dimensional metrology Bruenger WH, Kleinschmidt H, Hassler-Grohne W, Bosse H Journal of Vacuum Science & Technology B, 15(6), 2181, 1997 |
| 6 |
Chemically amplified deep ultraviolet resist for positive tone ion exposure Bruenger WH, Torkler M, Buchmann LM, Finkelstein W Journal of Vacuum Science & Technology B, 15(6), 2355, 1997 |
| 7 |
Hpr-506 Photoresist Used as a Positive Tone Ion Resist Bruenger WH, Buchmann LM, Torkler M, Sinkwitz S Journal of Vacuum Science & Technology B, 14(6), 3924, 1996 |
| 8 |
Electron-Beam-Induced Etching of Resist with Water-Vapor as the Etching Medium Kohlmannvonplaten KT, Bruenger WH Journal of Vacuum Science & Technology B, 14(6), 4262, 1996 |