검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Utilization of TXRF analytical technique in order to improve front-end semiconductor processing Budri T Applied Surface Science, 254(15), 4768, 2008 |
| 2 |
Front- and back-end process characterization by SIMS to achieve electrically matched devices Budri T, Kouzminov D Applied Surface Science, 231-2, 772, 2004 |
| 3 |
Suppressing baron penetration and cobalt silicide agglomeration in deep submicron p-channel metal-oxide-semiconductor devices Kamal AHM, Obeidat AT, Budri T Journal of Vacuum Science & Technology B, 20(1), 173, 2002 |