검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Plasma process induced surface damage removal Brooks CB, Buie MJ, Vaidya KJ Journal of Vacuum Science & Technology A, 16(1), 260, 1998 |
| 2 |
Characterization of the etch rate non-uniformity in a magnetically enhanced reactive ion etcher Buie MJ, Pender JTP, Dahimene M Journal of Vacuum Science & Technology A, 16(3), 1464, 1998 |
| 3 |
The Role of N-2 in Aspect-Ratio-Dependent Etching of SiO2 Buie MJ, Joshi AM, Regis J Journal of the Electrochemical Society, 144(11), 3935, 1997 |
| 4 |
In-Situ Diagnostic for Etch Uniformity Buie MJ, Pender JT, Soniker J, Brake ML, Elta M Journal of Vacuum Science & Technology A, 13(4), 1930, 1995 |