검색결과 : 5건
No. | Article |
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1 |
Modeling the plasma chemistry of C2F6 and CHF3 etching of silicon dioxide, with comparisons to etch rate and diagnostic data Ho P, Johannes JE, Buss RJ, Meeks E Journal of Vacuum Science & Technology A, 19(5), 2344, 2001 |
2 |
Chemical kinetics in chemical vapor deposition: growth of silicon dioxide from tetraethoxysilane (TEOS) Coltrin ME, Ho P, Moffat HK, Buss RJ Thin Solid Films, 365(2), 251, 2000 |
3 |
Simulations of BCl3/Cl-2/Ar plasmas with comparisons to diagnostic data Meeks E, Ho P, Ting AL, Buss RJ Journal of Vacuum Science & Technology A, 16(4), 2227, 1998 |
4 |
Synthesis of Silicon-Nitride Particles in Pulsed Radio-Frequency Plasmas Buss RJ, Babu SV Journal of Vacuum Science & Technology A, 14(2), 577, 1996 |
5 |
Solid-State Hydrogen Sensors Using Palladium-Nickel Alloys - Effect of Alloy Composition on Sensor Response Hughes RC, Schubert WT, Buss RJ Journal of the Electrochemical Society, 142(1), 249, 1995 |