화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Modeling the plasma chemistry of C2F6 and CHF3 etching of silicon dioxide, with comparisons to etch rate and diagnostic data
Ho P, Johannes JE, Buss RJ, Meeks E
Journal of Vacuum Science & Technology A, 19(5), 2344, 2001
2 Chemical kinetics in chemical vapor deposition: growth of silicon dioxide from tetraethoxysilane (TEOS)
Coltrin ME, Ho P, Moffat HK, Buss RJ
Thin Solid Films, 365(2), 251, 2000
3 Simulations of BCl3/Cl-2/Ar plasmas with comparisons to diagnostic data
Meeks E, Ho P, Ting AL, Buss RJ
Journal of Vacuum Science & Technology A, 16(4), 2227, 1998
4 Synthesis of Silicon-Nitride Particles in Pulsed Radio-Frequency Plasmas
Buss RJ, Babu SV
Journal of Vacuum Science & Technology A, 14(2), 577, 1996
5 Solid-State Hydrogen Sensors Using Palladium-Nickel Alloys - Effect of Alloy Composition on Sensor Response
Hughes RC, Schubert WT, Buss RJ
Journal of the Electrochemical Society, 142(1), 249, 1995