검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Thermal emissivity of carbon coated p-doped silicon stencil masks for ion projection lithography Braun D, Gajic R, Kuchar F, Korntner R, Haugeneder E, Loeschner H, Butschke J, Letzkus F, Springer R Journal of Vacuum Science & Technology B, 21(1), 123, 2003 |
| 2 |
Comparison of silicon stencil mask distortion measurements with finite element analysis Ehrmann A, Struck T, Chalupka A, Haugeneder E, Loschner H, Butschke J, Irmscher M, Letzkus F, Springer R, Degen A, Rangelow IW, Shi F, Sossna E, Volland B, Engelstad R, Lovell E, Tejeda R Journal of Vacuum Science & Technology B, 17(6), 3107, 1999 |
| 3 |
Comparative evaluation of electron-beam sensitive single layer top surface imaging and bilayer chemical amplification of resist lines process for stencil mask making Elian K, Irmscher M, Butschke J, Letzkus F, Reuter C, Springer R Journal of Vacuum Science & Technology B, 17(6), 3122, 1999 |
| 4 |
Directly sputtered stress-compensated carbon protective layer for silicon stencil masks Hudek P, Hrkut P, Drzik M, Kostic I, Belov M, Torres J, Wasson J, Wolfe JC, Degen A, Rangelow IW, Voigt J, Butschke J, Letzkus F, Springer R, Ehrmann A, Kaesmaier R, Kragler K, Mathuni J, Haugeneder E, Loschner H Journal of Vacuum Science & Technology B, 17(6), 3127, 1999 |
| 5 |
p-n junction-based wafer flow process for stencil mask fabrication Rangelow IW, Shi F, Volland B, Sossna E, Petrashenko A, Hudek P, Sunyk R, Butschke J, Letzkus F, Springer R, Ehrmann A, Gross G, Kaesmaier R, Oelmann A, Struck T, Unger G, Chalupka A, Haugeneder E, Lammer G, Loschner H, Tejeda R, Lovell E, Engelstad R Journal of Vacuum Science & Technology B, 16(6), 3592, 1998 |