| 1 |
Phase equilibria and azeotropic behavior of C2F6 + N-2 gas hydrates
Kim E, Ko G, Seo Y
Journal of Chemical Thermodynamics, 117, 43, 2018 |
| 2 |
Atmospheric pressure plasma of C2F6/N2 for the decomposition of C2F6 in a dielectric barrier discharge
Nguyen DB, Lee WG
Journal of Industrial and Engineering Chemistry, 57, 322, 2018 |
| 3 |
Enclathration of CHF3 and C2F6 molecules in gas hydrates for potential application in fluorinated gas (F-gas) separation
Kim E, Shin E, Ko G, Kim SH, Han OH, Kwak SK, Seo Y
Chemical Engineering Journal, 306, 298, 2016 |
| 4 |
Large Scale Treatment of Perfluorocompounds Using a Thermal Plasma Scrubber
Han SH, Park HW, Kim TH, Park DW
Clean Technology, 17(3), 250, 2011 |
| 5 |
Etch characteristics of indium zinc oxide thin films in a C2F6/Ar plasma
Lee DY, Chung CW
Thin Solid Films, 518(1), 372, 2009 |
| 6 |
Run-to-run control of inductively coupled C2F6 plasma etching of SiO2: Multivariable controller design and numerical application
Seo ST, Lee KS, Yang DR
Korean Journal of Chemical Engineering, 23(2), 199, 2006 |
| 7 |
Scale-up of ferro-electric packed bed reactor for C2F6 decomposition
Takaki K, Urashima K, Chang JS
Thin Solid Films, 506, 414, 2006 |
| 8 |
Run-to-Run Control of Inductively Coupled C2F6 Plasma Etching of SiO2: Construction of a Numerical Process with a Computational Fluid Dynamics Code
Seo ST, Lee YH, Lee KS, Choi BK, Yang DR
Korean Journal of Chemical Engineering, 22(6), 822, 2005 |
| 9 |
Inductively Coupled Plasma Etching of Pb(ZrxTi1- x)O3 Thin Films in Cl2/C2F6/Ar and HBr/Ar Plasmas
Chung CW, Byun YH, Kim HI
Korean Journal of Chemical Engineering, 19(3), 524, 2002 |
| 10 |
SiO2 etching in inductively coupled C2F6 plasmas: surface chemistry and two-dimensional simulations
Feldsien J, Kim D, Economou DJ
Thin Solid Films, 374(2), 311, 2000 |
