검색결과 : 1건
No. | Article |
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1 |
Increase of cleaning rate and reduction in global warming effect during C4F8O/O-2 remote plasma cleaning of silicon nitride by adding NO and N2O Oh CH, Lee NE, Kim JH, Yeom GY, Yoon SS, Kwon TK Thin Solid Films, 435(1-2), 264, 2003 |