검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Plasma enhanced chemical vapor deposition of thermally stable and low-dielectric-constant fluorinated amorphous carbon films using low-global-warming-potential gas C5F8 Shirafuji T, Kamisawa A, Shimasaki T, Hayashi Y, Nishino S Thin Solid Films, 374(2), 256, 2000 |
| 2 |
Radical kinetics for polymer film deposition in fluorocarbon (C4F8, C3F6 and C5F8) plasmas Takahashi K, Itoh A, Nakamura T, Tachibana K Thin Solid Films, 374(2), 303, 2000 |