| 1 |
Formation, thermal decomposition and atmospheric implications of the CF2(OH)CF2OONO2 and CF3CF2OONO2 peroxynitrates. A theoretical study
Badenes MP
Chemical Physics Letters, 673, 68, 2017 |
| 2 |
The first representative of a new family of the bridgehead-modified difluoromethylenated homofullerenes: electrochemical properties and synthetic availability
Rybalchenko AV, Magdesieva TV, Brotsman VA, Belov NM, Markov VY, Ioffe IN, Ruff A, Schuler P, Speiser B, Heinze J, Sidorov LN, Goryunkov AA
Electrochimica Acta, 174, 143, 2015 |
| 3 |
The disproportionation of CF2 carbene in vapor-phase pyrolysis reaction over activated carbon and porous aluminum fluoride
Yang GC, Jia XQ, Pan RM, Quan HD
Journal of Molecular Catalysis A-Chemical, 309(1-2), 184, 2009 |
| 4 |
Pyrolysis of a mixture of trifluoromethane and tetrafluoroethylene to produce hexafluoropropylene
Moon DJ, Ahn BS
Journal of Chemical Engineering of Japan, 37(2), 318, 2004 |
| 5 |
Rate coefficient for self-association reaction of CF2 radicals determined in the afterglow of low-pressure C4F8 plasmas
Suzuki C, Sasaki K, Kadota K
Plasma Chemistry and Plasma Processing, 21(1), 139, 2001 |
| 6 |
The singlet-triplet separation in dichlorocarbene: A surprising difference between theory and experiment
Barden CJ, Schaefer HF
Journal of Chemical Physics, 112(15), 6515, 2000 |
| 7 |
Correlation between CF2 and CxFy densities in C4F8 plasmas
Sasaki K, Takizawa K, Takada N, Kadota K
Thin Solid Films, 374(2), 249, 2000 |
| 8 |
Mechanism of fluorine reduction in C4F8/Ar parallel-plate-type electron-cyclotron-resonance plasma by a Si top plate
Hayashi H, Okigawa M, Morishita S, Sekine M
Journal of Vacuum Science & Technology A, 17(5), 2517, 1999 |
| 9 |
Silicon oxide selective etching process keeping harmony with environment by using radical injection technique
Fujita K, Ito M, Hori M, Goto T
Journal of Vacuum Science & Technology A, 17(6), 3260, 1999 |
| 10 |
Viscosity of fluorinated propane isomers. 2. Measurements of three compounds and model comparisons
Laesecke A, Hafer RF
Journal of Chemical and Engineering Data, 43(1), 84, 1998 |
