| 1 |
Design of photoresists with reduced environmental impact. II. Water-soluble resists based on photocrosslinking of poly(2-isopropenyl-2-oxazoline)
Havard JM, Yoshida M, Pasini D, Vladimirov N, Frechet JMJ, Medeiros DR, Patterson K, Yamada S, Willson CG, Byers JD
Journal of Polymer Science Part A: Polymer Chemistry, 37(9), 1225, 1999 |
| 2 |
Study of acid diffusion in resist near the glass transition temperature
Fryer DS, Bollepali S, de Pablo JJ, Nealey PF
Journal of Vacuum Science & Technology B, 17(6), 3351, 1999 |
| 3 |
Photoresists with reduced environmental impact: Water-soluble resists based on photo-cross-linking of a sugar-containing polymethacrylate
Havard JM, Vladimirov N, Frechet JMJ, Yamada S, Willson CG, Byers JD
Macromolecules, 32(1), 86, 1999 |
| 4 |
Real-time Fourier transform infrared spectroscopy study of the kinetics of acid-catalyzed negative-tone resists based on hexamethoxymethylmelamine and phenolic resins
Dentinger PM, Taylor JW
Journal of Vacuum Science & Technology B, 16(6), 3759, 1998 |
