검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Absolute densities and kinetics of H atoms and CFx radicals in low-pressure, high-density CHF3 plasmas Sasaki K, Okamoto M Thin Solid Films, 506, 705, 2006 |
| 2 |
Study of the SiO2-to-Si3N4 etch selectivity mechanism in inductively coupled fluorocarbon plasmas and a comparison with the SiO2-to-Si mechanism Schaepkens M, Standaert TEFM, Rueger NR, Sebel PGM, Oehrlein GS, Cook JM Journal of Vacuum Science & Technology A, 17(1), 26, 1999 |