검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Development of Cat-CVD apparatus - a method to control wafer temperatures under thermal influence of heated catalyzer Karasawa M, Masuda A, Ishibashi K, Matsumura H Thin Solid Films, 395(1-2), 71, 2001 |
| 2 |
Plasma and Processing Effects of Electrode Spacing for Tungsten Etchback Using a Bipolar Electrostatic Wafer Clamp Marx WF, Ra YJ, Yang R, Chen CH Journal of Vacuum Science & Technology A, 12(6), 3087, 1994 |