검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Pulsed plasma-enhanced chemical vapor deposition from CH2F2, C2H2F4, and CHCIF2 Labelle CB, Gleason KK Journal of Vacuum Science & Technology A, 17(2), 445, 1999 |
| 2 |
Fluorinated amorphous carbon films for low permittivity interlevel dielectrics Theil JA Journal of Vacuum Science & Technology B, 17(6), 2397, 1999 |
| 3 |
Formation and characterization of the fluorocarbonated-SiO2 films by O-2/FTES-helicon plasma chemical vapor deposition Oh KS, Kang MS, Lee KM, Kim DS, Choi CK, Yun SM, Chang HY, Kim KH Thin Solid Films, 345(1), 45, 1999 |