검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Coating of TiO2 thin films on particles by a plasma chemical vapor deposition process Kim DJ, Kang JY, Kim KS Advanced Powder Technology, 21(2), 136, 2010 |
| 2 |
BCl3/Ne etching of III-V semiconductors in a planar inductively coupled plasma reactor Lim WT, Baek IK, Lee JW, Lee ES, Jeon MH, Cho GS, Pearton SJ Applied Surface Science, 222(1-4), 74, 2004 |
| 3 |
Surface diffusion model accounting for the temperature dependence of tungsten etching characteristics in a SF6 magnetoplasma Bounasri F, Pelletier J, Moisan M, Chaker M Journal of Vacuum Science & Technology B, 16(3), 1068, 1998 |