화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Admittance spectroscopy for non-crystalline thin film devices characterization: comparison of Cu(In,Ga)Se-2 and a-Si : H cases
Mencaraglia D, Saad SO, Djebbour Z
Thin Solid Films, 431-432, 135, 2003
2 The mechanism of hydrogen gas evolution on GaAs cathodes elucidated by in situ infrared spectroscopy
Erne BH, Ozanam F, Chazalviel JN
Journal of Physical Chemistry B, 103(15), 2948, 1999
3 Silicon etching during the HFCVD diamond growth
Arnault JC, Hubert S, Le Normand F
Journal of Physical Chemistry B, 102(25), 4856, 1998
4 Hydrogen in silicon : Fundamental properties and consequences for devices
Van de Walle CG
Journal of Vacuum Science & Technology A, 16(3), 1767, 1998
5 The Influence of the Inductively-Coupled Hydrogen Plasma on the GaAs Surface-Properties
Pincik E, Jergel M, Kucera M, Brunel M
Thin Solid Films, 299(1-2), 136, 1997