| 1 |
A comparative study on wear behavior of TiN and diamond coated WC-Co substrates against hypereutectic Al-Si alloys
Chakravarthy GV, Chandran M, Bhattacharya SS, Rao MSR, Kamaraj M
Applied Surface Science, 261, 520, 2012 |
| 2 |
Effects of plasma treatment in the tungsten process for chemical vapor deposition titanium nitride barrier film beyond nanometer technology
Chen KW, Wang YL, Chang L, Li FY, Hwang GJ
Thin Solid Films, 498(1-2), 64, 2006 |
| 3 |
A study of diamond synthesis by hot filament chemical vapour deposition on nanocomposite coatings
Polini R, Amar M, Ahmed W, Kumashiro S, Sein H, Colligon S
Thin Solid Films, 489(1-2), 116, 2005 |
| 4 |
Atmospheric-Pressure Chemical-Vapor-Deposition of Titanium Nitride from Tetrakis (Diethylamido) Titanium and Ammonia
Musher JN, Gordon RG
Journal of the Electrochemical Society, 143(2), 736, 1996 |
| 5 |
A 0.25 Mu-M MOSFET Technology Using in-Situ Rapid Thermal Gate Dielectrics
Zhang KX, Osburn CM, Hames G, Parker C, Bayoumi A
Journal of the Electrochemical Society, 143(2), 744, 1996 |
