화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Variations in the physico-chemical properties of near-stoichiometric silica deposited from SiH4-N2O and SiH4-N2O-He radiofrequency discharges
Chayani M, Caquineau H, Despax B, Bandet J, Berjoan R
Thin Solid Films, 471(1-2), 53, 2005
2 Influence of the relative humidity on film formation by vapor induced phase separation
Caquineau H, Menut P, Deratani A, Dupuy C
Polymer Engineering and Science, 43(4), 798, 2003
3 Influence of the Reactor Design in the Case of Silicon-Nitride PECVD
Caquineau H, Despax B
Chemical Engineering Science, 52(17), 2901, 1997
4 Reactor Modeling for Radio-Frequency Plasma Deposition of Sinxhy - Comparison Between 2 Reactor Designs
Caquineau H, Dupont G, Despax B, Couderc JP
Journal of Vacuum Science & Technology A, 14(4), 2071, 1996