화학공학소재연구정보센터
검색결과 : 8건
No. Article
1 Comparative study of Cl-2, Cl-2/O-2, and Cl-2/N-2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP
Carlstrom CF, van der Heijden R, Andriesse MSP, Karouta F, van der Heijden RW, van der Drift E, Salemink HWM
Journal of Vacuum Science & Technology B, 26(5), 1675, 2008
2 Cl-2/O-2-inductively coupled plasma etching of deep hole-type photonic crystals in InP
Carlstrom CF, van der Heijden R, Karouta F, van der Heijden RW, Salemink HWM, van der Drift E
Journal of Vacuum Science & Technology B, 24(1), L6, 2006
3 Characterization of mass-transport grown GaN by hydride vapour-phase epitaxy
Paskova T, Paskov PP, Goldys EM, Valcheva E, Darakchieva V, Sodervall U, Godlewski M, Zielinski M, Hautakangas S, Saarinen K, Carlstrom CF, Wahab Q, Monemar B
Journal of Crystal Growth, 273(1-2), 118, 2004
4 Characterization of damage in InP dry etched using nitrogen containing chemistries
Carlstrom CF, Anand S
Journal of Vacuum Science & Technology B, 19(5), 1905, 2001
5 Buried heterostructure complex-coupled distributed feedback 1.55 mu m lasers fabricated using dry etching processes and quaternary layer overgrowth
Soderstrom D, Lourdudoss S, Carlstrom CF, Anand S, Kahn M, Kamp M
Journal of Vacuum Science & Technology B, 17(6), 2622, 1999
6 Trimethylamine: Novel source far low damage reactive ion beam etching of InP
Carlstrom CF, Anand S, Landgren G
Journal of Vacuum Science & Technology B, 17(6), 2660, 1999
7 Extremely smooth surface morphologies in N-2/H-2/CH4 based low energy chemically assisted ion beam etching of InP GaInAsP
Carlstrom CF, Anand S, Landgren G
Thin Solid Films, 343-344, 374, 1999
8 Low energy ion beam etching of InP using methane chemistry
Carlstrom CF, Landgren G, Anand S
Journal of Vacuum Science & Technology B, 16(3), 1018, 1998