검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Effects of amine fluoride cleaning chemistry on metallic aluminum integrated circuit films - I. Experimental measurements and chemical Modeling Carter MK, Small R, Cernat M, Hansen B Journal of the Electrochemical Society, 150(2), B52, 2003 |
| 2 |
Effect of de-ionized water parameters rinse on postmetal etch residue removal using semiaqueous cleaning chemistries Small R, Kirk S, Cernat M Journal of Vacuum Science & Technology B, 20(2), 635, 2002 |